Detailed Program (PDF file)

 

 

 

 

Program Schedule

6th International Workshop on Bulk Nitride Semiconductors - Galindia 2009

 

 

 

SUNDAY, August 23th, 2009

 

 

11:00                                     Departure from Warsaw IBIS Stare Miasto Hotel to Galindia Hotel (Conference site)

 

12:30                                     Lunch in Pazibroda Restaurant in Maków Mazowiecki

 

17:00                                     Arrival to Galindia Hotel

 

19:00                                     Dinner

 

 

 

MONDAY, August 24th, 2009

 

 

7:00 - 8:15                          Breakfast

 

 

8:30 - 9:00                          Welcome and orientation

                                               Jaime Freitas

                                               Michał Boækowski

 

 

9:00 - 10:20                         Session 1: GaN by Ammonothermal method 1

                                               Chair: Zlatko Sitar

 

9:00 - 9:30                    Robert Dwiliński - scene setter, Ammono, Poland,

Recent Achievements in AMMONO-bulk method

 

9:30 - 10:00                 Tadao Hashimoto - scene setter, Six Point Material Inc., USA,

                                   Improvement of crystal quality in ammonothermal growth of bulk GaN

 

10:00 - 10:30                Buguo Wang - scene setter, Air Force, USA

Crystallographic properties of GaN bulk crystals grown by the ammonothermal technique

 

 

10:30 - 10:50                      Coffee Break

 

 

10:50 - 12:20                      Session 2: GaN by Ammonothermal method 2

                                               Chair: Mike Leszczyński

 

            10:50 - 11:20                Makoto Saito - scene setter, UCSB, USA

Evaluation of GaN Crystals Grown in Supercritical Basic Ammonia

 

11:20 - 11:40                Siddha Pimputkar, UCSB, USA

Plane Dependence of GaN Grown by the Ammonothermal Method

 

            11:40 - 12:00                Roman Doradziński, Ammono, Poland

                                               Non-polar AMMONO-GaN

 

            12:00 - 12:20                Dirk Ehrentraut, Tohoku University, Japan

                                               Ammonothermal growth of GaN

 

 

12:30 - 14:00                      Lunch

 

 

14:00 - 15:10                      Session 3: AlN  Bulk crystals

                                               Chair: Jim Speck

 

            14:00 - 14:30                Zlatko Sitar - scene setter, HexaTech, USA

                                               Challenges in AlN crystal growth and path to the AlN wafers

 

            14:30 - 14:50                Boris Epelbaum, Univ. Erlangen-Nurnberg, Germany,

Growth direction and polarity influence on properties of bulk aluminum nitride crystals

 

            14:50 - 15:10                Octavian Filip, Univ. Erlangen-Nurnberg, Germany,

                                               Crystal growth of mixed AlN-SiC bulk crystals

 

 

15:10 - 15:20                      Break

 

 

15:20 - 16:30                      Session 4: Defects in bulk AlN

                                               Chair: Zuzanna Liliental-Weber

 

            15:20 - 15:50                James H. Edgar - scene setter, Kansas State Univ., USA

                                               Characterization of sublimation grown bulk AlN crystals

 

            15:50 - 16:10                Martin Albrecht, IKZ, Germany

                                               Cation vacancy related donor acceptor pair transitions in bulk AlN

 

            16:10 - 16:30                Keiichiro Hironaka, Tokuyama Co., Japan

                                               Characterization of AlN single crystals

 

 

16:30 - 16:50                      Coffee Break

 

 

 

 

 

 

 

16:50 - 18:40                      Session 5: Bulk AlN by template seeding

                                               Chair: Boris Epelbaum

 

            16:50 - 17:20                Hideto Miyake - scene setter, Mie University, Japan

                                               Growth of high quality AlN on patterned substrate by HVPE

 

            17:20 - 17:40                Reza Yazdi, Linkoping Univ., Sweden

                                               Pyramid enabled growth and separation of AlN wafers

 

            17:40 - 18:00                Carsten Hartmann, IKZ, Germany

Initial growth stages of the hetero-epitaxial PVT growth of AlN on miscut 4H-SiC substrates

 

            18:00 - 18:20                Tadashi Ohashi, Doshisha Univ., Japan

Growth of 2H-AlN films on Si(111) grown by RF-MBE using an interface reaction epitaxy and AM-MEE for HVPE growth

 

            18:20 - 18:40                Yoshinao Kumagai, TUAT, Japan

Investigation of void formation beneath thin AlN layers by decomposition of sapphire substrates for self-separation of thick AlN layers grown by HVPE

 

 

19:00 - 21:00                      Dinner

 

 

 

TUESDAY, August 25th, 2009

 

 

7:30 - 8:30                          Breakfast

 

 

9:00 - 10:30                         Session 6: Bulk GaN and AlN by HVPE

                                               Chair: Tadek Suski

 

            9:00 - 9:30                   Akinori Koukitu - scene setter, TUAT, Japan

                                               Investigation of source precursor for AlN-HVPE to decrease

Si-contamination          

 

            9:30 - 9:50                   Bernd Schineller, AIXTRON AG, Germany

VHVPE for GaN boule growth: New hardware optimizations and recent experimental results

 

            9:50 - 10:10                 Eberhard Richter, Ferdinand Braun Institut, Germany

                                               VHVPE for GaN boule growth: Growth results and material properties

 

 

10:10 - 10:30                      Coffee Break

 

 

10:30 - 12:00                      Session 7: Bulk GaN by HVPE and VPE

                                               Chair: Akinori Koukitu

 

            10:30 - 11:00                Sungsoo Park - scene setter, Samsung Electronic, Co, South Korea

                                               The growth of Bulk GaN by Hydride Vapor Phase Epitaxy (HVPE)

 

            11:00 - 11:20                Yun Komiyama, Covalent Material Corporation and TUAT, Japan

                                               Thick film of SiC and GaN grown on Si by vapor phase epitaxy

 

            11:20 - 11:40                Paul Hageman, Redboud Univ., The Netherlands

                                               Chlorine based HVPE for the growth of thick GaN layers

 

            11:40 - 12:00                Stanisław Krukowski, IHPP Unipress, Warsaw, Poland

GaN(0001) surface in ammonia-dominated ambient: static and dynamic DFT study

 

 

12:30 - 14:30                      Lunch

 

 

14:30 - 15:10                      Session 8: Non-polar GaN by HVPE

                                               Chair: Paul Hageman

 

            14:30 - 14:50                Hyun-Jae Lee, Tohoku Univ., Japan

                                               Interface engineering in HVPE growth of Free-standing GaN

 

 

            14:50 - 15:10                Bolesław Łucznik, IHPP Unipress, Poland

                                               Non-polar HVPE GaN as seed for solution growth under pressure

 

 

15:10 - 15:30                      Coffee Break

 

 

15:30 - 17:20                      Session 9: InGaN and InN on bulk nitride substrates

                                               Chair: Jaime Freitas

 

            15:30 - 16:00                Yoichi Kawakami - scene setter, Kyoto University, Japan

Recombination dynamics in semi-polar {11-22} InGaN/GaN quantum wells

 

            16:00 - 16:20                Czesław Skierbiszewski, IHPP Unipress, Poland

Optically pumped InAlGaN lasers at 480 nm by Plasma Assisted MBE 

 

            16:20 - 16:40                Tadek Suski, IHPP Unipress, Poland

                                               Substrate orientation dependent properties of InGaN

 

            16:40 - 17:00                Yuhuai Liu, Tohoku Univ., Japan

                                               Perspective in growth of high-quality InN by pressurized MOVPE.

 

            17:00 - 17:20                Stephan Figge, Univ. of Bremen, Germany

Self organized grown InGaN quantum dots on hetero- and homoepitaxial substrates

 

 

 

17:20- 17:40                       Coffee Break

 

 

17:40 - 18:50                      Session 10: Devices on bulk nitride substrates

                                               Chair: Yoichi Kawakami

 

            17:40 - 18:10                Jim Speck - scene setter, UCSB, USA

Progress in the Growth, Characterization and Device Performance for Nonpolar and Semipolar GaN-based Materials

 

            18:10 - 18:30                Wojtek Knap, Univ. Montpellier, France

Terahertz plasma oscillations in nanometer size GaN/AlGaN transistors

 

            18:30 - 18:50                Michał Leszczyński, IHPP, Unipress, Poland

Morphology and microstructure of AlInGaN layers used in constructing violet laser diodes

 

 

 

19:00 - 21:00                      Dinner

 

 

 

Wednesday, August 26th, 2009

 

 

7:30 - 8:30                          Breakfast

 

9:00 - 10:30                         Session 11: GaN by Low Pressure Solution method

                                                Chair: Sylwester Porowski

 

            9:00 - 9:30                   Boris Feigelson - scene setter, US NRL, USA

Growth of bulk GaN crystals from solution at near atmospheric pressure

 

            9:30 - 9:50                   Nelson Garces, US NRL, USA

Characterization of bulk GaN crystals from solution at near atmospheric pressure

 

            9:50 - 10:10                 Jaime Freitas, US NRL, USA

Optical probing of solution growth crystal properties

 

            10:10 - 10:30                Elke Meissner, Fraunhofer Institut, Germany

Liquid Phase Epitaxy of GaN on AlN and considerations on substrate preparation

 

 

 

10:30 - 10:50                      Coffee Break

 

 

10:50 - 12:00                      Session 12: GaN  and AlN by Flux methods,

Chair: Roman Doradziński

 

            10:50 - 11:20                Yoshihiro Kangawa - scene setter, RIAM, Kyushu Univ., Japan

                                               Possibility of AlN growth using Li-Al-N solvent

 

            11:20:11:40                  Young Kuk Lee, Korea Res. Inst. of Chem. Technology, South Korea

                                               Growth of ZnO and GaN Single Crystal by Solvothermal Technique

 

            11:40 - 12:00                Michał Boækowski, IHPP Unipress, Poland

                                               Ca3N2 as a flux for crystal growth of GaN under high pressure

 

 

12:30 - 14:00                      Lunch

 

14:00                                                Group outgoing:-kayaking by Krutynia River

 
See: 
http://www.masuria-canoeing.com/krutynia_en/index.html

 

 

19:00                                     Dinner on location with camp-fire in Galindia Hotel

 

 

 

Thursday, August 27th, 2009

 

 

8:00 - 9:00                          Breakfast

 

 

 

9:20 - 10:50                        Session 13: GaN  and AlGaN by High Pressure Solution method 

Chair: Boris Feigelson

 

            9:20 - 9:50                   Andrey Belousov - scene setter, ETH Zurich

                                               High pressure thermodynamics and crystal growth of AlxGa1-xN.

 

            9:50 - 10:10                 Andrey Belousov, ETH Zurich

                                               Single crystals of AlxGa1-xN: high pressure growth and properties

 

            10:10 - 10:30                Sylwester Porowski, IHPP Unipress, Poland

High Pressure GaN crystals on HVPE GaN seeds as substrates for laser diodes

 

            10:30 - 10:50                Izabella Grzegory, IHPP Unipress, Poland

                                               The influence of Indium on the growth of GaN crystals from solution

 

 

 

 

10:50 - 11:10                      Coffee Break

 

 

 

11:10 - 13:00                      Session 14: Defects in nitrides, 

Chair: Martin Albrecht

 

            11:10 - 11:40                Zuzanna Liliental-Weber - scene setter, LBNL, USA

Extended defects in III-Nitrides and their origin

 

            11:40 - 12:00                Jaime Freitas, US NRL, USA

On the properties of thick GaN homoepitaxial films

 

            12:00 - 12:20                Filip Tuomisto, Helsinki Univ. Of Technology, Finland

Formation of point defects in ammonothermal growth of GaN

 

            12:20 - 12:40                Jan Weyher, IHPP Unipress, Poland

                                               Extended defects in HVPE-grown GaN

 

            12:40 - 13:00                Joachim Woitok, PANalytical, The Netherlands

                                               X-ray scattering methods for the structural characterization of bulk

single crystals

 

 

 

13:00 - 15:00                      Lunch

 

 

 

 

15:00 - 16:45                      Rump session : Market trends in wide band gap semiconductor materials and closing of the IWBNS-6

Chair: Dirk Ehrentraut

 

            15:00 - 15:20                Hank Rodeen, Strategies Unlimited, USA

Markets, Manufacturability, and Cost Reduction (SiC, GaN, AlN)  (2009)

 

            15:20 - 15:30                Izabella Grzegory, IHPP Unipress, Poland

                                               Summary of the Workshop - Highlights from the Program

 

            15:30 - 16:30                Panel Discussion

 

            16:30 - 16:45                Conference Chairpersons

                                               Summary and closing of the IWBNS-6

 

 

 

18:00-22:00                         Galindówka with Official Dinner

 

 

22:00-                                               Discotheque

 

 

 

Friday, August 28th, 2009

 

 

8:30 - 9:30                          Breakfast

 

 

11:00                                     Departure from Galindia Hotel to Warsaw IBIS Stare Miasto Hotel

 

 

12:00                                     Lunch in Tusinek Restaurant

 

 

17:00                                     Arrival to Warsaw IBIS Stare Miasto Hotel