Scene Setter Speakers

Andrey Belousov
Thermodynamics of the Ga-Al-N system at high N2 pressure
ETH Zurich, Swiss
Robert Dwiliński
Recent Achievements in AMMONO-bulk method
Ammono Sp. z o.o., Poland
James H. Edgar
Impurities and Defects in Bulk Aluminum Nitride Crystals
Kansas State Univ., USA
Boris Feigelson
Growth of bulk GaN crystals from solution at near atmospheric pressure
US NRL, USA
Tadao Hashimoto
Improvement of crystal quality in ammonothermal growth of bulk GaN
SixPoint Materials, Inc., USA
Yoshihiro Kangawa
Possibility of AlN growth using Li-Al-N solvent
RIAM, Kyushu Univ., Japan
Yoichi Kawakami
Recombination dynamics in semi-polar 11-22 InGaN-GaN quantum wells
Kyoto University, Japan
Akinori Koukitu
Investigation of source precursor for AlN-HVPE to decrease Si-contamination
TUAT, Japan
Zuzanna Liliental-Weber
Structural changes in InGaN with increasing In content and thickness
LBNL, USA
Hideto Miyake
HVPE growth of high-quality AlN on trench-patterned substrate
Mie University, Japan
Sungsoo Park
The growth of bulk GaN by HVPE
Samsung Electronic, Co, South Korea
Hank Rodeen
Markets, Manufacturability, and Cost Reduction (SiC, GaN, AlN)" (2009)
Strategies Unlimited, USA
Makoto Saito
Plane dependent growth of GaN in supercritical basic ammonia and evaluation of GaN substrates
UCSB, USA
Zlatko Sitar
Challenges in AlN crystal growth and path to the AlN wafers
HexaTech, Inc., USA
Jim Speck
LEDs and LDs on non-polar and semi-polar GaN substrates
UCSB, USA
Buguo Wang
Crystallographic properties of GaN bulk crystals grown by the ammonothermal technique
Air Force, USA