Equipment

Characterization of materials and devices

Nikon optical microscope

Characterization of materials and devices

X‑ray diffractometer (XRD)

Characterization of materials and devices

Delta Technologies X‑ray goniometer for crystal orientation (3 units)

Characterization of materials and devices

Mitutoyo surface roughness tester

Characterization of materials and devices

Bruker Atomic Force Microscope (AFM)

Characterization of materials and devices

ATOS optical 3D metrology system (interferometry/structured light)

Characterization of materials and devices

Zeiss optical microscope

Characterization of materials and devices

Nikon optical microscope

Characterization of materials and devices

Sensofar S Lynx

Characterization of materials and devices

Transfer system for 2D layered structures based on exfoliation located in a neutral atmosphere in a glove box

Characterization of materials and devices

Setup based on Vector Network Analyzer (VNA)

Characterization of materials and devices

Lake Shore LS-CRX-VF cryogenic probe station operating in the range of 10-500 K with built-in magnetic field up to 2.5 T