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Laboratorium Syntezy Amonotermalnej

Laboratory NL-13

Research topics

The Ammonothermal Synthesis Laboratory focuses on the growth of bulk GaN single crystals using the basic ammonothermal method. The processes are carried out under high pressure and temperature, and the research includes optimization of crystallization parameters and scaling the technology toward larger, higher-quality crystals. A key research direction is the analysis of all stages of the crystallization process to deepen understanding of the conditions and phenomena occurring inside the reactor, supported by computational methods and computer modelling. 

The laboratory also covers the complete crystal processing and metrology workflow: orientation, cutting, polishing/CMP, and assessment of surface and structural quality using microscopy and X-ray diffraction techniques.

News

Calculations prove limited Si diffusion in GaN
01/06/2026
Science and research

Calculations prove limited Si diffusion in GaN

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IHPP PAS at the 2nd Finnish-Polish Symposium on Nitride Semiconductor Science and Technology in Helsinki
25/05/2026
Events
Important

IHPP PAS at the 2nd Finnish-Polish Symposium on Nitride Semiconductor Science and Technology in Helsinki

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Equipment

Computer modeling

“UNIPRESS Library – repository of numerical models of physical phenomena”

Computer modeling

logpli – Python library for recombination kinetics analysis

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=120 (4 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=100 (12 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=60 (4 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=40 (2 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=20 (5 units)

Characterization of materials and devices

X‑ray diffractometer (XRD)

Fabrication of materials and structures

MBRAUN high‑purity gloveboxes (2 units)

Fabrication of materials and structures

CMP polishing machines (4 units)

Characterization of materials and devices

Delta Technologies X‑ray goniometer for crystal orientation (3 units)

Characterization of materials and devices

Mitutoyo surface roughness tester

Fabrication of materials and structures

TAKATORI WSD‑K2 single‑wire saw (SWS)

Fabrication of materials and structures

DWT diamond wire saw – MES type (2 units)

Fabrication of materials and structures

DWT diamond wire saw – SWS type (2 units)

Fabrication of materials and structures

LAM PLAN bench‑top polishing machines (8 units)

Characterization of materials and devices

Bruker Atomic Force Microscope (AFM)

Characterization of materials and devices

ATOS optical 3D metrology system (interferometry/structured light)

Characterization of materials and devices

Zeiss optical microscope

Characterization of materials and devices

Nikon optical microscope

Fabrication of materials and structures

CNC machining center R1000 "Baca" (2 units)

Research and science