From 30 August to 3 September 2026, the 21st edition of the international Conference on Defects Recognition, Imaging and Physics in Semiconductors (DRIP21) was held in Warsaw. The conference was organized by the Institute of High Pressure Physics of the Polish Academy of Sciences and the Institute of Physics of the Polish Academy of Sciences. It was dedicated to the study of defects in semiconductor materials and the latest advances in their identification, imaging and characterization.
The conference brought together 86 participants from 17 countries. The scientific programme covered recent developments in a wide range of experimental techniques used for defect analysis, as well as research on defects in various semiconductor materials, including nitrides, silicon carbide and emerging semiconductor materials. An important part of the programme was also devoted to defect modelling and the impact of defects on material properties.
The next, 22nd edition of the conference will be held in 2028 in Hangzhou, China, and will be organized by Zhejiang University.
The conference also included a meeting of the DRIP International Steering Committee. Congratulations to prof. Julita Smalc-Koziorowska from the Institute of High Pressures of the Polish Academy of Sciences who was appointed as a Chair of this Committee.