Title: Monolityczna integracja wielokolorowych matryc mikro- i nano-LEDów
Project leader: Grzegorz Muzioł
Laboratory: Molecular Beam Epitaxy Laboratory (NL-14)
Project number: FENG.02.02-IP.05-0012/23
Implementation date: 01.08.2024 31.07.2028
Total funding granted: 3 991 975 zł
Funding for the entity: 3 991 975 zł

Project description

The project's goal is to create technology for producing monolithically integrated, addressable arrays of micro- and nano-LEDs that emit visible light. Soon, micro-LED arrays will find widespread applications in bright, high-resolution displays, Li-Fi wireless communication, and augmented and virtual reality glasses. This is expected to happen within the next decade. Further reducing the size of emitters and developing nano-LED array technology will, in turn, enable spatial control of light emission at a scale below the wavelength of light and the construction of devices operating below the diffraction limit of optical systems. Nano-LED arrays are expected to be used in: Optogenetics Super-resolution microscopy Maskless photolithography Chemical and biomedical sensors The technology being developed as part of this project is based on the growth of thin crystalline (Al,In)GaN layers using molecular beam epitaxy and advanced processing methods. The heart of the proposed solution lies in tunnel junctions (TJs), which, grown directly on the light-emitting layer, change the conductivity type and allow for the growth of another light-emitting layer with a different wavelength. This design enables color mixing from multiple active regions grown on the same substrate, without the need for transfer and precise positioning. This is particularly important for devices with dimensions measured in micrometers and nanometers. To define the light-emitting areas and create electrical paths, enabling the fabrication of arrays and the addressing of each device individually, ion implantation is planned. The research will be conducted in collaboration with six international partners.
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