Title: Terahercowy rezonans plazmowy w strukturach AlGaN/GaN z bramką w kształcie grzebienia i kanałem w kształcie płetwy
Project leader: Pavlo Sai
Laboratory: Terahertz Laboratory (TeraGaN) (NL-11)
Call/Programme name: PRELUDIUM
Project number: 2019/35/N/ST7/00203
Implementation date: 26.06.2020 25.06.2022
Implementing entity: Institute of High Pressure Physics
Total funding granted: 139 800 zł
Funding for the entity: 139 800 zł
Funding institution: National Science Center

Project description

A promising detector of terahertz (THz) radiation is a field effect transistor (FET) with high mobility twodimensional electron gas (2DEG) channel. Estimates for the real parameters of FET show that the frequencies
of plasma excitations of charge carriers (plasmons) in the 2DEG transistor channel are in the THz frequency
range [1]. Existing THz FET detectors operate in a wide range of THz frequencies, at ambient temperature and
show a good balance between sensitivity and speed at non-resonant regime of detection [2], where plasmons
are overdamped and the FET response is a smooth function of frequency as well as of the gate voltage. The
main advantage of resonant regime of detection is narrow band signal with maxima at the plasma oscillation
frequency and tunable by the gate voltage, which is not fully realized so far. For instance, control of resonant
frequency can be used to obtain color images in THz range from a single array of detectors that are key
elements in navigation systems, substance identification systems, industrial and anti-terrorism safety systems,
terahertz tomography, astrophysics and other fields of science and technology.
The gated two-dimensional plasma excitations have a linear dispersion ωp = sk, where ωp is the plasmon
frequency, k is the wave vector, s is the velocity of two-dimensional plasma waves. In turn, the velocity of
plasmons is proportional to the square root of electron density in a 2DEG layer. Therefore, a transistor structure
based on a material system with a high electron density in a layer of a 2DEG will be characterized by a high
adjustable frequency in the THz range. Therefore, the AlGaN/GaN nanoheterostructure looks promising for
applications in THz detectors, where the 2DEG density reaches 1013 cm–2. Thus, the resonant plasmon
frequency can be tuned over a wide range due to changing the concentration of electrons by applying a voltage
to the gate.
Among existing problems of high quality resonant plasmonic detectors in THz frequency range it is
worth to mention the weak coupling of the transistor structure with THz radiation [3] and existing of the oblique
plasma modes that propagate at different angles between source and drain terminals and make resonance
broader and weaker as it was demonstrated in the first experiments of resonant and voltage-tunable THz
detection in nanometer transistors [4].
This project is a basic research project, where the scientific objective is to investigate the plasmonic
resonance phenomena in the AlGaN/GaN structures with the grating-gate and fin-shaped channel. The
main goal of this project is to study the effects that are responsible for effective coupling between the shortwave gated plasmon oscillations and the relatively long-wavelength THz radiation and suppression the oblique
modes excitation of plasma waves in AlGaN/GaN grating-gate and fin-shaped transistor structures.
Timeliness and novelty of the proposed research comes from recently developed progress of the
epitaxial growth of AlGaN/GaN structures and innovative design of grating-gate structures of large
(1.5×1.5 mm2) area and fin-shaped structures with two lateral Schottky barrier gates. Where the first approach
has following advantages: i) diffraction of incident electromagnetic radiation, which modulates radiation in
the near field, enabling the excitation of plasmon, as result increasing of coupling efficiency between incoming
THz radiation and plasma waves in 2DEG layer; ii) determination of wave vectors of excited plasmons due to
periodic gate structure; iii) suppression of oblique plasma modes due to grating-gate action as an effective THz
polarizer. Second our approach is fin-shaped structure, where channel length is much greater than channel
width. In this geometry the oblique plasma modes are suppressed due to ability of propagation only in one
direction between source and drain. Previously we have proposed the simple realization of wire channel
transistor geometry by using two lateral Schottky barrier gates [5]. In this case lateral Schottky barrier gates
are deposited directly to the edges of fin-shaped AlGaN/GaN channel, that makes possible to change channel
width by gate voltage bias. Our preliminary studies of DC characteristics and non-resonant response in the
sub-THz frequency confirm the validity of the approach [6].
Therefore, we expect that the project will have very high impact on the research field and discipline
because it will answer the main question: are the high quality plasma resonances in the grating-gate and finshaped AlGaN/GaN structures possible and in which physical conditions (geometry, material properties, etc.)
they can reach high quality factors. Understanding of the mechanism of broadening should also allow us to
define FET structures useful for THz spectroscopy and imaging in security, quality control or medical
applications. We expect also important outcome from the point of view of future applications thanks to new
efficient THz detectors. Therefore, research proposed in the project may have important economic and
societal impact.

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