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Crystal Growth Laboratory

Laboratory NL-3

Research topics

The Laboratory of Crystallization (NL-3) focuses on the growth of bulk GaN crystals and nitride-based ternary alloys such as AlGaN, as well as other technologically relevant compounds. The research is driven by a fundamental understanding of crystal growth mechanisms and related processes, including intentional doping.

Crystal growth studies are carried out using two principal methods: Halide Vapor Phase Epitaxy (HVPE) and High Pressure (HP) technology. The high-pressure systems in the laboratory are capable of withstanding extreme conditions, reaching pressures up to 2 GPa and temperatures up to 1450°C simultaneously. These parameters create unique opportunities to investigate crystallization under non-standard thermodynamic conditions. Within this thermodynamic range, changes in crystal structure, defect formation, and resulting physical properties can be systematically examined. In addition, the laboratory develops epitaxial semiconductor structures for optoelectronic and electronic applications using Metal-Organic Vapor Phase Epitaxy (MOVPE).

The laboratory’s activities also include controlled doping and advanced material characterization, including optical microscopy in the visible and ultraviolet ranges, X-ray diffraction, photo-etching, and defect-selective etching. Complementary defect-revealing techniques are employed to identify dislocations and electrically active inhomogeneities in GaN and SiC crystals, while photoetched GaN nanostructures can additionally serve as efficient SERS platforms for trace chemical detection.

The research integrates materials engineering, physics, and chemistry to advance the scientific understanding of crystal growth processes relevant to modern nitride-based semiconductor technologies.

Equipment

Characterization of materials and devices

Nikon optical microscope

Fabrication of materials and structures

TAKATORI WSD‑K2 single‑wire saw (SWS)

Fabrication of materials and structures

High pressure chamber Φ30

Fabrication of materials and structures

High pressure chamber Φ40

Fabrication of materials and structures

High pressure chamber Φ60

Fabrication of materials and structures

High pressure chamber Φ100

Characterization of materials and devices

Sensofar S Lynx

Fabrication of materials and structures

Custom-built CMP machine (Unipress)

Fabrication of materials and structures

Custom-built HVPE reactors (Unipress)

Fabrication of materials and structures

Custom-built CMP machine (Unipress)

Fabrication of materials and structures

LOGTECH 1PM54-1

Fabrication of materials and structures

LAM PLAN M.M. 8400

Fabrication of materials and structures

Lapmaster 15

Characterization of materials and devices

Optical microscope Nicon Eclypse LV150 N

Fabrication of materials and structures

Hotplate CT 10

Fabrication of materials and structures

Q150R S Sputter Coater Quorum

Fabrication of materials and structures

Q150R Sputter Coater Quorum

Fabrication of materials and structures

Xe lamp 1000W Oriel

Fabrication of materials and structures

Xe lamp 300W Oriel

Research and science